发明名称 |
OPTICAL SYSTEM, ADJUSTMENT METHOD OF OPTICAL SYSTEM, EXPOSURE DEVICE AND EXPOSURE METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a high performance optical system capable of efficiently correcting a rotation-asymmetrical aberration component which is caused by the deformation of an optical member and the like due to the heat generation by light irradiation and the effect of long-term exposure. SOLUTION: The optical system is provided with heat transfer bodies 31, 32 disposed inside a reflective member for forming a required temperature distribution over a reflection surface CMa of the reflective member CM and a control part 33 for controlling the heat transfer bodies 31, 32. The control part controls a plurality of the first heat transfer bodies 31 having a first characteristic (exothermic action) and a plurality of the second heat transfer bodies 32 having a second characteristic (endothermic action) different from the first characteristic independently. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005140999(A) |
申请公布日期 |
2005.06.02 |
申请号 |
JP20030377449 |
申请日期 |
2003.11.06 |
申请人 |
NIKON CORP |
发明人 |
SUZUKI GOJI;SHINKAI MASAHIKO |
分类号 |
G02B5/10;G02B5/08;G03F7/20;H01L21/027;(IPC1-7):G02B5/10 |
主分类号 |
G02B5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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