发明名称 OPTICAL SYSTEM, ADJUSTMENT METHOD OF OPTICAL SYSTEM, EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To provide a high performance optical system capable of efficiently correcting a rotation-asymmetrical aberration component which is caused by the deformation of an optical member and the like due to the heat generation by light irradiation and the effect of long-term exposure. SOLUTION: The optical system is provided with heat transfer bodies 31, 32 disposed inside a reflective member for forming a required temperature distribution over a reflection surface CMa of the reflective member CM and a control part 33 for controlling the heat transfer bodies 31, 32. The control part controls a plurality of the first heat transfer bodies 31 having a first characteristic (exothermic action) and a plurality of the second heat transfer bodies 32 having a second characteristic (endothermic action) different from the first characteristic independently. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005140999(A) 申请公布日期 2005.06.02
申请号 JP20030377449 申请日期 2003.11.06
申请人 NIKON CORP 发明人 SUZUKI GOJI;SHINKAI MASAHIKO
分类号 G02B5/10;G02B5/08;G03F7/20;H01L21/027;(IPC1-7):G02B5/10 主分类号 G02B5/10
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