发明名称 ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSITCONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS
摘要 For manufacturing particularly uniform and mirror bright copper coatings tha t are leveled and ductile as well using a relatively high current density, halogenated or pseudohalogenated monomeric pheanzinium compounds or a purity at least 85 mole-% and having the general chemical formula (I) are utilized in which R1, R2, R3, R4. R5, R6, R7, R7~~, R8, R9, X and A.macr.have the significations denoted in the claims. The compounds are prepared by diazotizing a suited starting compound prior to halogenating or pseudohalogenating it in the presence of mineral acid, diazotization means a nd halide or pseudohalide, with the reaction steps being run in one single vess el.
申请公布号 CA2542356(A1) 申请公布日期 2005.06.02
申请号 CA20042542356 申请日期 2004.11.09
申请人 ATOTECH DEUTSCHLAND GMBH 发明人 DAHMS, WOLFGANG;GRIESER, UDO;BRUNNER, HEIKO
分类号 C07D241/46;C25D3/38 主分类号 C07D241/46
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