| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film deposition apparatus suitable for depositing a mixed film or a multilayered film formed of a plurality of materials under an optimum condition on an object for film deposition, a thin film deposition method by the apparatus, and an optical element deposited by the thin film deposition method. SOLUTION: The thin film deposition apparatus 10 has a plurality of sputtering sources having targets comprising at least either selected from two or more same materials and two or more different materials and disposed inside a chamber 12, and is provided with a film deposition condition set part capable of setting different film deposition conditions to the respective sputtering sources. COPYRIGHT: (C)2005,JPO&NCIPI
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