| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of, and a program product for optimizing an intensity profile of a pattern to be formed in a surface of a substrate relative to a given mask using an optical system. <P>SOLUTION: The method includes steps of: mathematically representing a resolvable feature from a given mask; generating a mathematical expression and an eigenfunction to represent specified characteristics of the optical system; modifying the mathematical expression and the eigenfunction by filtering; generating an interference map in accordance with the filtered eigenfunction and the mathematical expression of the given mask; and determining an assist feature for the given mask based on the interference map. As a result, undesired printing in the surface of the substrate can be minimized. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
