GLOW DISCHARGE-GENERATED CHEMICAL VAPOR DEPOSITION

摘要

A process for creating plasma polymerized deposition on a substrate using a glow discharge is described. The glow discharge is created between an electrode (16) and a counterelectrode (24). A mixture of a balance gas and a tetraalkylorthosilicate is flowed through the glow discharge onto a substrat e (28) to deposit a coating onto the substrate as an optically clear coating o r to create surface modification. The process, which is preferably carried out at or near atmospheric pressure, can be designed to create an optically clea r powder-free or virtually powder free coating.