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发明名称
栅极装置
摘要
本案为一种栅极装置,系设于溅镀系统之溅镀枪(Sputter)与被镀物之间,其特征在于栅极装置系电连接至电压源而具有电压准位,且允许带电离子通过,并藉以调整带电离子撞击被镀物之速度。
申请公布号
TW200518199
申请公布日期
2005.06.01
申请号
TW092132727
申请日期
2003.11.21
申请人
聚昌科技股份有限公司
发明人
范志文;胡正中
分类号
H01L21/203
主分类号
H01L21/203
代理机构
代理人
主权项
地址
新竹县竹北市沿河街123号
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