| 发明名称 |
Shower head structure for processing semiconductor |
| 摘要 |
A shower head structure disposed in a device 2 for processing a semiconductor while supplying processing gas to a processing space S for storing a heated processed substrate W, comprising a shower head 12 having a plurality of gas injection holes 20 B for supplying the processing gas and a light introducing rod 68 of a radiation thermometer 66 inserted into at least one of the gas injection holes 20 B.
|
| 申请公布号 |
US2005118737(A1) |
申请公布日期 |
2005.06.02 |
| 申请号 |
US20040505169 |
申请日期 |
2004.08.30 |
| 申请人 |
TAKAGI TOSHIO;SAKUMA TAKESHI;KATO YUJI;MATSUMOTO KENJI |
发明人 |
TAKAGI TOSHIO;SAKUMA TAKESHI;KATO YUJI;MATSUMOTO KENJI |
| 分类号 |
C23C16/52;H01J37/32;H01L21/00;H01L21/3065;H01L21/31;(IPC1-7):H01L21/66;G01R31/26;H01L21/44;C23C16/00 |
主分类号 |
C23C16/52 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
