发明名称 |
Compositions for the removal of organic and inorganic residues |
摘要 |
A composition and method using same for removing photoresist and/or processing residue from a substrate are described herein. In one aspect, there is provided a composition for removing residue consisting essentially of: an acidic buffer solution having an acid selected from a carboxylic acid or a polybasic acid and an ammonium salt of the acid in a molar ratio of acid to ammonium salt ranging from 10:1 to 1:10; an organic polar solvent that is miscible in all proportions in water; a fluoride, and water wherein the composition has a pH ranging from about 3 to about 7.
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申请公布号 |
US2005119143(A1) |
申请公布日期 |
2005.06.02 |
申请号 |
US20040942290 |
申请日期 |
2004.09.15 |
申请人 |
EGBE MATTHEW I.;RIEKER JENNIFER M.;PETERS DARRYL W.;WARD IRL E. |
发明人 |
EGBE MATTHEW I.;RIEKER JENNIFER M.;PETERS DARRYL W.;WARD IRL E. |
分类号 |
C11D3/00;C11D7/04;C11D7/10;C11D7/26;C11D7/30;C11D7/32;C11D7/50;C11D9/60;C11D11/00;G03F7/42;H01L21/027;H01L21/304;(IPC1-7):C11D1/00 |
主分类号 |
C11D3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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