发明名称 Optical instrument, exposure apparatus, and device manufacturing method
摘要 Disclosed is an optical instrument and an exposure apparatus having the same, wherein the optical instrument includes an optical element, a position adjusting member provided in relation to the optical member, a casing for accommodating the optical element therein, the casing having a partition wall from which at least a portion of the position adjusting member can be exposed, an outer cover for openably/closably covering the partition wall, and a supplying system for supplying an inactive gas into the casing.
申请公布号 US2005117226(A1) 申请公布日期 2005.06.02
申请号 US20040978332 申请日期 2004.11.02
申请人 CANON KABUSHIKI KAISHA 发明人 YAMAMOTO SUMITADA
分类号 G03F7/20;G02B13/14;G03F9/00;H01L21/027;(IPC1-7):G02B15/14 主分类号 G03F7/20
代理机构 代理人
主权项
地址