| 摘要 |
A method for material processing utilizing a material processing system to perform a process. The method performs a process ( 510 ), measures a scan of data ( 520 ), and transforms the data scan ( 530 ) into a signature ( 540 ) including at least one spatial component. The scan of data ( 530 ) can include a process performance parameter such as an etch rate, an etch selectivity, a deposition rate, a film property, etc. The signature ( 540 ) can be stored ( 550 ), and compared with either a previously acquired signature or with an ideal signature ( 560 ). If at least one spatial component substantially deivates from the reference spatial component, then a process fault has potentially occurred. If the cumulative deviation of all spatial components or a select group of components substantially deviates from a reference set of spatial components, then a process fault has potentially occurred.
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