发明名称 Thin film transistor with tapered edges
摘要 A thin film transistor according to the present invention may include a gate insulating layer; and a lower pattern placed below the gate insulating layer to contact therewith and having an edge with a taper angle of at most about 80 DEG . With this design, dielectric strength of the gate insulating layer can be enhanced. The lower pattern can be a gate electrode layer.
申请公布号 EP1536482(A1) 申请公布日期 2005.06.01
申请号 EP20040090476 申请日期 2004.11.29
申请人 SAMSUNG SDI CO., LTD. 发明人 HWAN, EUI-HUN;LEE, SANG-GUL;KIM, DEUK-JONG
分类号 H01L21/336;H01L29/423;H01L29/786 主分类号 H01L21/336
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