发明名称 Measuring method and apparatus using shearing interferometry, exposure method and apparatus using the same, and device manufacturing method
摘要 A measuring method for measuring wave front of light, which passed through a target optical system includes the steps of, generating an interference fringe using a shearing interference with light that passes a target optical system, calculating a differential wave front between a first wave front of the light that passes the target optical system and a second wave front made by offsetting the first wave front by a predetermined amount in a predetermined direction, and correcting the differential wave front based on the predetermined amount and the wave number in the predetermined direction.
申请公布号 US2005117168(A1) 申请公布日期 2005.06.02
申请号 US20040994331 申请日期 2004.11.23
申请人 CANON KABUSHIKI KAISHA 发明人 OUCHI CHIDANE
分类号 G21K1/06;G01B9/02;G01J9/02;G01M11/02;G03F7/20;G21K5/00;G21K5/02;H01L21/027;(IPC1-7):G01B9/02 主分类号 G21K1/06
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