| 发明名称 |
Compositions and methods for chemical mechanical polishing silica and silicon nitride |
| 摘要 |
<p>The present invention provides an aqueous composition useful for polishing silica and silicon nitride on a semiconductor wafer comprising by weight percent 0.001 to 1 phthalic acid and salts thereof, 0.001 to 1 quaternary ammonium compound, 0.01 to 5 carboxylic acid polymer, 0.01 to 5 abrasive and balance water.</p> |
| 申请公布号 |
EP1535979(A2) |
申请公布日期 |
2005.06.01 |
| 申请号 |
EP20040257062 |
申请日期 |
2004.11.15 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. |
发明人 |
MUELLER, BRIAN;XU, HAOFENG |
| 分类号 |
B24B37/00;C09G1/02;C09K3/14;H01L21/304;H01L21/3105;(IPC1-7):C09G1/02 |
主分类号 |
B24B37/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
