METHOD FOR DEPOSITING FLUORINE-DOPED SILICATE GLASS IN SEMICONDUCTOR,申请号KR20030083883-传众专利搜索

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发明名称	METHOD FOR DEPOSITING FLUORINE-DOPED SILICATE GLASS IN SEMICONDUCTOR
摘要
申请公布号	KR20050050196(A)	申请公布日期	2005.05.31
申请号	KR20030083883	申请日期	2003.11.25
申请人	DONGBUANAM SEMICONDUCTOR INC.	发明人	KIM, RAE SUNG
分类号	(IPC1-7):H01L21/20	主分类号	(IPC1-7):H01L21/20
代理机构		代理人
主权项
地址

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