发明名称 |
Method of forming multi-layers for a thin film transistor |
摘要 |
The present invention concerns a method of forming multi-layers such as base-coat and active layers for TFTs. In accordance with the preferred embodiment of the present invention, a first layer is formed on a transparent substrate using a physical vapor deposition. And a second layer is sequentially formed using a physical vapor deposition on the first layer without breaking vacuum. The present invention simplifies the TFT fabrication while decreasing the water or hydrogen content within multilayers including a base-coat (BC) layer.
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申请公布号 |
US6900083(B2) |
申请公布日期 |
2005.05.31 |
申请号 |
US20010945063 |
申请日期 |
2001.08.31 |
申请人 |
SHARP LABORATORIES OF AMERICA, INC. |
发明人 |
VOUTSAS APOSTOLOS;NAKATA YUKIHIKO |
分类号 |
G02F1/13;G02F1/1368;H01L21/316;H01L21/336;H01L29/786;(IPC1-7):H01L21/336 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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