发明名称 |
Configurable single substrate wet-dry integrated cluster cleaner |
摘要 |
The present invention provides a method and an apparatus for cleaning substrates. The cleaning chamber defines a processing cavity adapted to accommodate a substrate therein. In one embodiment, the cleaning chamber includes a chamber body having a processing cavity defined therein. A substrate is disposed in the processing cavity without contacting other chamber components by a Bernoulli effect and/or by a fluid cushion above and/or below the substrate. Fluid is flowed into the processing cavity at an angle relative to a radial line of the substrate to induce and/or control rotation of the substrate during a cleaning and drying process.
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申请公布号 |
US6899111(B2) |
申请公布日期 |
2005.05.31 |
申请号 |
US20010999751 |
申请日期 |
2001.10.31 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LUSCHER PAUL E.;CARDUCCI JAMES D.;SALIMIAN SIAMAK;WELCH MICHAEL D. |
分类号 |
B08B3/04;H01L21/00;(IPC1-7):B08B3/00 |
主分类号 |
B08B3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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