发明名称 Method for forming a region of low dielectric constant nanoporous material using a microemulsion technique
摘要 A method for forming a region of low dielectric constant nanoporous material is disclosed. In one embodiment, the present method includes the step of preparing a microemulsion. The method of the present embodiment then recites applying the microemulsion to a surface above which it is desired to form a region of low dielectric constant nanoporous material. Next, the present method recites subjecting the microemulsion, which has been applied to the surface, to a thermal process such that the region of low dielectric constant nanoporous material is formed above the surface.
申请公布号 US6899857(B2) 申请公布日期 2005.05.31
申请号 US20010012298 申请日期 2001.11.13
申请人 CHARTERED SEMICONDUCTORS MANUFACTURED LIMITED 发明人 PHENG SOO CHOI;CHAN LAP;YANG WANG CUI;KONG SIEW YONG;SEE ALEX
分类号 C08J9/28;H01L21/316;H01L21/768;(IPC1-7):C01B33/12;C03C3/00;C04B38/00;C04B35/14 主分类号 C08J9/28
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