发明名称 |
Method for forming a region of low dielectric constant nanoporous material using a microemulsion technique |
摘要 |
A method for forming a region of low dielectric constant nanoporous material is disclosed. In one embodiment, the present method includes the step of preparing a microemulsion. The method of the present embodiment then recites applying the microemulsion to a surface above which it is desired to form a region of low dielectric constant nanoporous material. Next, the present method recites subjecting the microemulsion, which has been applied to the surface, to a thermal process such that the region of low dielectric constant nanoporous material is formed above the surface.
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申请公布号 |
US6899857(B2) |
申请公布日期 |
2005.05.31 |
申请号 |
US20010012298 |
申请日期 |
2001.11.13 |
申请人 |
CHARTERED SEMICONDUCTORS MANUFACTURED LIMITED |
发明人 |
PHENG SOO CHOI;CHAN LAP;YANG WANG CUI;KONG SIEW YONG;SEE ALEX |
分类号 |
C08J9/28;H01L21/316;H01L21/768;(IPC1-7):C01B33/12;C03C3/00;C04B38/00;C04B35/14 |
主分类号 |
C08J9/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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