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发明名称
Fabrication method of metal interconnection for semiconductor
摘要
申请公布号
KR100492914(B1)
申请公布日期
2005.05.31
申请号
KR20030006300
申请日期
2003.01.30
申请人
发明人
分类号
H01L21/28;(IPC1-7):H01L21/28
主分类号
H01L21/28
代理机构
代理人
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地址
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