发明名称 |
Photoresist processing aid and method |
摘要 |
A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.
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申请公布号 |
US6900003(B2) |
申请公布日期 |
2005.05.31 |
申请号 |
US20030408414 |
申请日期 |
2003.04.07 |
申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
ANZURES EDGARDO;LUNDY DANIEL E.;BARR ROBERT K.;O'CONNOR COREY |
分类号 |
G03F7/32;G03F7/42;(IPC1-7):G03F7/32 |
主分类号 |
G03F7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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