LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要
Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
申请公布号
SG111309(A1)
申请公布日期
2005.05.30
申请号
SG20040006939
申请日期
2004.10.22
申请人
ASML NETHERLANDS B.V.;CARL ZEISS SMT AG
发明人
HOOGENDAM, CHRISTIAAN ALEXANDER;LOOPSTRA, ERIK ROELOF;STREEFKERK, BOB;GELLRICH, BERNARD;WURMBRAND, ANDREAS