发明名称 METHOD OF FABRICATING CIRCULAR OR ANGULAR SPIRAL MIM CAPACITORS
摘要 A method of forming a capacitor comprising the following steps. A substrate having a lower low-k dielectric layer formed thereover is provided with the lower low-k dielectric layer having a dielectric constant of less than about 3.0. Metal vertical electrode plates are formed within the lower low-k dielectric layer so that the adjacent metal vertical electrode plates have lower low-k dielectric layer portions therebetween. The lower low-k dielectric layer portions between the adjacent metal vertical electrode plates are replaced with high-k dielectric material trench portions having a dielectric constant of greater than about 3.0.
申请公布号 SG111242(A1) 申请公布日期 2005.05.30
申请号 SG20040006158 申请日期 2004.10.18
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING LTD. 发明人 SHAO KAI;NG CHIT HWEI;PURAKH RAJ VERMA;ZHENG JIA ZHEN;SANFORD CHU
分类号 H01L27/08 主分类号 H01L27/08
代理机构 代理人
主权项
地址