| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic apparatus, provided with a lighting system which is improved so that a projection beam of radiation has uniformity in a part of the cross section of the projection beam. SOLUTION: The lighting system is provided with at least one movable optical element 7 so that the projection beam of a radiation 4 can be shifted around a center position. This means that nonuniformity of the intensity distribution in the projection beam 4 is smeared out and next, improved uniformity of the exposure of a wafer, other substrates or the like illuminated by the system is provided. The optical element 7 can be provided with a mirror which can be moved by a motor, a prism, a filter, a lens, an axicon, a diffuser, a diffraction optical array, an optical integrator or the like. A device-manufacturing method, using such a lithographic apparatus, is further provided, and the optical element is moved, in order to provide optimal uniformity concerning the projected beam of the radiation. COPYRIGHT: (C)2005,JPO&NCIPI
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