发明名称 |
SEMICONDUCTOR INTEGRATED CIRCUIT AND WIRING DESIGN METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To improve controllability and to improve yield in fine work of a semiconductor integrated circuit by securing the density of wiring vias and securing the regularity and uniformity of a layout pattern, in a plurality of wiring layers having wiring patterns and a relay wiring layer having a plurality of vias connecting the wiring layers in wiring design of the semiconductor integrated circuit. SOLUTION: Design is performed on the basis of two basic wiring pattern layers where regularity is previously given and the wiring patterns are formed and on a basic via array layer which is positioned between the layers, and in which the vias are formed by previously giving regularity. Thus, the facility and reliability of a work are improved in a manufacture process and products. COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005135971(A) |
申请公布日期 |
2005.05.26 |
申请号 |
JP20030367374 |
申请日期 |
2003.10.28 |
申请人 |
TOSHIBA MICROELECTRONICS CORP;TOSHIBA CORP |
发明人 |
KITABAYASHI SHINJI;URAKAWA YUKIHIRO |
分类号 |
H01L21/00;G06F17/50;H01L21/3205;H01L21/768;H01L21/82;H01L21/822;H01L23/52;H01L23/522;H01L23/528;H01L27/04;(IPC1-7):H01L21/82;H01L21/320 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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