| 摘要 |
PROBLEM TO BE SOLVED: To provide a new polycyclic compound useful as an additive for improving etching resistance and heat resistance of a resist material for a resist for far ultraviolet rays. SOLUTION: The polycyclic compound represented by formula (1) has a structure obtained by bonding a tricyclic compound having a polar group such as an oxo group to a 1-12C monovalent linear or cyclic hydrocarbon through an ester bond so as to be bonded to an adamantane skeleton, such as 2-oxoadamantan-5-yl 1-adamantanecarboxylate represented by the formula. COPYRIGHT: (C)2005,JPO&NCIPI
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