发明名称 |
METHOD AND DEVICE FOR CORRECTING SLM STAMP IMAGE IMPERFECTIONS |
摘要 |
<p>The invention relates to production and precision patterning of work pieces, including manufacture of photomask for photolithography and direct writing on other substrates, such as semiconductor substrates. In particular, it relates to applying corrections to pattern data, such as corrections for distortions in the field of an SLM exposure stamp. It may be used to produce a device on a substrate. Alternatively, the present invention may be practiced as a device practicing disclosed methods or as an article of manufacture, particularly a memory, either volatile or non-volatile memory, including a program adapted to carry out the disclosed methods.</p> |
申请公布号 |
WO2005047955(A1) |
申请公布日期 |
2005.05.26 |
申请号 |
WO2004SE01638 |
申请日期 |
2004.11.10 |
申请人 |
MICRONIC LASER SYSTEMS AB;SANDSTROEM, TORBJOERN;OLSSON, MARTIN;ROSLING, MATS |
发明人 |
SANDSTROEM, TORBJOERN;OLSSON, MARTIN;ROSLING, MATS |
分类号 |
G03F7/20;(IPC1-7):G02B26/02 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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