发明名称 |
Method for controlled application of reactive vapors to produce thin films and coatings |
摘要 |
A vapor phase deposition method and apparatus for the application of thin layers and coatings on substrates. The method and apparatus are useful in the fabrication of electronic devices, micro-electromechanical systems (MEMS), Bio-MEMS devices, micro and nano imprinting lithography, and microfluidic devices. The apparatus used to carry out the method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. The apparatus provides for precise addition of quantities of different combinations of reactants during a single step or when there are a number of different individual steps in the coating formation process. The precise addition of each of the reactants in vapor form is metered into a predetermined set volume at a specified temperature to a specified pressure, to provide a highly accurate amount of reactant. |
申请公布号 |
US2005109277(A1) |
申请公布日期 |
2005.05.26 |
申请号 |
US20040018173 |
申请日期 |
2004.12.21 |
申请人 |
KOBRIN BORIS;NOWAK ROMUALD;YI RICHARD C.;CHINN JEFFREY D. |
发明人 |
KOBRIN BORIS;NOWAK ROMUALD;YI RICHARD C.;CHINN JEFFREY D. |
分类号 |
B05D1/18;B05D3/14;B05D7/24;C09D4/00;C23C16/00;C23C16/455;H01L;(IPC1-7):C23C16/00 |
主分类号 |
B05D1/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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