发明名称 |
LIQUID DROP APPLYING METHOD, LIQUID DROP APPLYING APPARATUS, DEVICE, AND ELECTRONIC EQUIPMENT |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a liquid drop applying method and a liquid drop applying apparatus by which a uniform film and a pattern of minute line width can be formed and quality inferiority such as disconnection is not caused. <P>SOLUTION: While conducting relative displacement of a liquid drop ejecting head 20 and a substrate 2, liquid drops are ejected from the liquid drop ejecting head 20 and are applied onto a predetermined region of a surface of the substrate 2. The liquid drop is ejected toward the surface of the substrate 2 in a direction crossing a perpendicular direction and when the liquid drop is ejected while conducting relative displacement of the liquid drop ejecting head 20 and the substrate 2, the liquid drop is ejected along a relative displacement direction. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2005131498(A) |
申请公布日期 |
2005.05.26 |
申请号 |
JP20030369061 |
申请日期 |
2003.10.29 |
申请人 |
SEIKO EPSON CORP |
发明人 |
MIURA HIROTSUNA |
分类号 |
B41J2/01;B05C5/00;B05D1/02;B05D1/26;B05D7/00;H01L51/00;H05K3/12;(IPC1-7):B05D1/26 |
主分类号 |
B41J2/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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