发明名称 SUPPLY CONTROL SYSTEM AND METHOD THEREFOR, PROGRAM, AND INFORMATION STORAGE
摘要 PROBLEM TO BE SOLVED: To provide a supply control system, or the like for appropriately controlling the supply of lots and masks to a photo device. SOLUTION: A supply control unit 100 includes lot management data 142 for managing a plurality of lots, reticle management data 144 for managing a plurality of masks; a storage 140 for storing inline photo device management data 146 for managing the photo device; an updating section 130 for updating the data; a control information generator 120 for generating lot supply control information for controlling the supply of lots and mask supply control information for controlling the supply of masks, based on the lot management data 142 and the reticle management data 144; and a communication section 110 for transmitting lot supply control information to a lot feeder for supplying lots to the photo device, transmitting mask supply control information to the mask feeder for supplying masks to the photo device, and receiving notification information for indicating the current position of lots or masks from the lot feeder, mask feeder, or photo device. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005136295(A) 申请公布日期 2005.05.26
申请号 JP20030372138 申请日期 2003.10.31
申请人 SEIKO EPSON CORP 发明人 KATO HIFUMI;TADANO AKIRA;SUGAWARA YUKI
分类号 H01L21/027;G03B27/62;(IPC1-7):H01L21/027 主分类号 H01L21/027
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