发明名称 CMOS ON HYBRID SUBSTRATE WITH DIFFERENT CRYSTAL ORIENTATIONS FORMED BY EMPLOYING SILICON-TO-SILICON DIRECT WAFER BONDING
摘要 PROBLEM TO BE SOLVED: To provide a hybrid substrate, equipped with semiconductor layers, having different crystal orientations isolated by a conductive or an insulating interface. SOLUTION: A method of providing a hybrid substrate, equipped with semiconductor layers having different crystal orientations that are isolated by a conductive or an insulating interface formed by employing semiconductor-to-semiconductor direct wafer bonding, is disclosed. The hybrid substrate may also be yielded by a method, employing a direct bonding method which provides an integrated semiconductor structure, in which various CMOSs are constructed on plane directions which enhance the performance of a device. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005136410(A) 申请公布日期 2005.05.26
申请号 JP20040310704 申请日期 2004.10.26
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 LEONG MEIKEI;REZNICEK ALEXANDER;YANG MIN
分类号 H01L21/822;H01L21/02;H01L21/8238;H01L27/04;H01L27/08;H01L27/092;H01L27/12;H01L29/786;(IPC1-7):H01L21/823 主分类号 H01L21/822
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