| 摘要 |
Disclosed is a high density plasma apparatus, which is capable of preventing breakage of an insulation film due to a potential difference by removing the potential difference in the course of transferring a wafer from a process chamber to a transfer chamber after completing a plasma process. The high density plasma apparatus may include a transfer chamber including a wafer transfer robot; a process chamber connected to the transfer chamber for plasma-processing a wafer being transferred by the wafer transfer robot; and an ultraviolet irradiator provided in the transfer chamber for irradiating an ultraviolet ray on the wafer plasma-processed in the process chamber and being transferred to the transfer chamber.
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