| 发明名称 |
Compositions and methods for chemical mechanical polishing silica and silicon nitride |
| 摘要 |
The present invention provides an aqueous composition useful for polishing silica and silicon nitride on a semiconductor wafer comprising by weight percent 0.001 to 1 phthalic acid and salts thereof, 0.001 to 1 quaternary ammonium compound, 0.01 to 5 carboxylic acid polymer, 0.01 to 5 abrasive and balance water.
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| 申请公布号 |
US2005108947(A1) |
申请公布日期 |
2005.05.26 |
| 申请号 |
US20030722736 |
申请日期 |
2003.11.26 |
| 申请人 |
MUELLER BRIAN L.;XU HAOFENG |
发明人 |
MUELLER BRIAN L.;XU HAOFENG |
| 分类号 |
B24B37/00;C09G1/02;C09K3/14;H01L21/304;H01L21/3105;(IPC1-7):B24D3/02 |
主分类号 |
B24B37/00 |
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