发明名称 MANUFACTURING METHOD FOR MATRIX FOR MICROLENS ARRAY
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a matrix for a microlens array, which enables the manufacture of the matrix for the microlens array, composed of a unit cell with curvature controlled with an extremely high degree of accuracy, on a conventionally unrealizable large-area substrate by solving the problem of roughening of a substrate surface, as a defect in laser ablation. <P>SOLUTION: In this manufacturing method for the matrix for forming an optical member provided with the many microlens arrays, a photomask 2, where a mask pattern is formed, is arranged above the substrate 1; a laser beam 3 is applied via the photomask 2, so that a desired three-dimensional pattern depending on the mask pattern can be formed on the substrate 1; in this case, the spot size of the laser beam 3 is increased so that the laser beam can pass through the photomask 2; and subsequently, the spot size of the laser beam 3 is reduced for the application of the laser beam 1 to the surface of the substrate 1, so that the surface of the substrate can be partially evaporated. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005131940(A) 申请公布日期 2005.05.26
申请号 JP20030370508 申请日期 2003.10.30
申请人 ARISAWA MFG CO LTD 发明人 AOKI YUICHI;YAKUSHIJI KENICHI;ADACHI KEISUKE
分类号 G03F7/20;B29C33/38;B29L11/00;G02B3/00;(IPC1-7):B29C33/38 主分类号 G03F7/20
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