发明名称 Photovoltaic device and manufacturing method thereof
摘要 There is provided a photovoltaic device in which at least one pin-junction is formed in a thin film semiconductor deposited on a substrate, the substrate including: a base including polycrystalline silicon; and a polycrystalline silicon layer formed on the base by liquid phase growth, in which at least a part of a surface of the polycrystalline silicon layer has unevenness composed of facet surfaces. The photovoltaic device prevents a reduction in photoelectric conversion efficiency due to the absence of preferable unevenness, an increase in cost due to the use of an expensive material, and a reduction in throughput in the photovoltaic device, and has a preferable characteristic and high productivity.
申请公布号 US2005109388(A1) 申请公布日期 2005.05.26
申请号 US20040971130 申请日期 2004.10.25
申请人 CANON KABUSHIKI KAISHA 发明人 MURAKAMI TSUTOMU;NISHIDA SHOJI
分类号 H01L31/04;H01L31/00;H01L31/0236;H01L31/0368;H01L31/075;H01L31/18;(IPC1-7):H01L31/00 主分类号 H01L31/04
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