| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method, etc. which adjusts the edge shot exposure time and operation of a robot arm to make the throughput enhanced. SOLUTION: A wafer transfer operation by a robot arm RA1 or RA2 is performed in parallel with an edge shot. These transfer operations and timing of the edge shots are adjusted so that the throughput of this exposure work is maximized. The period of time required for a normal shot and the edge shot is found, and with the required period of time of the transfer operation as the parameter, exposure operation (order of shots or the period of time required for the shot) such that the throughput is maximized, when the conveying operation is performed during the edge shot. COPYRIGHT: (C)2005,JPO&NCIPI
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