| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an optimal polishing pad for CMP polishing. <P>SOLUTION: A textured surface featuring system 100 includes a featuring device 110 for featuring its surface in contact with a textured surface 104 of an article 108. A featuring system includes a fluid delivery system 204 for flowing a fluid 128 on the textured surface, when the textured surface is brought into contact with the featuring device. Pressure measuring structures 144 and 160 of the featuring device provide pressure data on the fluid when flowing on the textured surface. By using the pressure data, the textured surface is featured. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
