| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a refractive-index-changing layer which changes a refractive index in a thickness direction, on a substrate without changing a film-forming material. <P>SOLUTION: The method for forming the refractive-index-changing layer through ion-plating the substrate with a desired material as a film-forming material comprises changing the refractive index of the film-formed layer by introducing a reactive gas while controlling the amount to be introduced. Thereby, the refractive index-changing layer of which the refractive index changes in the thickness direction, is formed on the substrate without changing the film-forming material. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
