发明名称 METHOD FOR MANUFACTURING TRANSFLECTIVE SUBSTRATE, METHOD FOR MANUFACTURING ELECTRO-OPTICAL APPARATUS, TRANSFLECTIVE SUBSTRATE, ELECTRO-OPTICAL APPARATUS AND ELECTRONIC APPLIANCE
摘要 <P>PROBLEM TO BE SOLVED: To prevent partial peeling of a base layer during manufacturing a transflective substrate to be installed in an electro-optical apparatus. <P>SOLUTION: In steps of manufacturing a transflective substrate, a photosensitive resin 132 is first applied on a second substrate 120 as shown in Figure (a). Then the resin is subjected to first exposure by using a first reticle 145 as shown in Figure (b), and then to second exposure by using a second reticle 148 as shown in Figure (c). After the two steps of exposure, the resin is developed to form a base layer 130. In the exposure process, areas of a light transmitting part 146a for an opening and of a light transmitting part 149a for an opening are varied from each other so as to form a step 130a in the side wall of an opening 125. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005134474(A) 申请公布日期 2005.05.26
申请号 JP20030367678 申请日期 2003.10.28
申请人 SEIKO EPSON CORP 发明人 OTAKE TOSHIHIRO;KANEKO HIDEKI;UEHARA TOSHINORI;NAKANO TOMOYUKI;TAKIZAWA KEIJI
分类号 G02B5/02;G02F1/13;G02F1/1335;G03F7/20;G03F7/40 主分类号 G02B5/02
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