发明名称 |
METHOD FOR MANUFACTURING TRANSFLECTIVE SUBSTRATE, METHOD FOR MANUFACTURING ELECTRO-OPTICAL APPARATUS, TRANSFLECTIVE SUBSTRATE, ELECTRO-OPTICAL APPARATUS AND ELECTRONIC APPLIANCE |
摘要 |
<P>PROBLEM TO BE SOLVED: To prevent partial peeling of a base layer during manufacturing a transflective substrate to be installed in an electro-optical apparatus. <P>SOLUTION: In steps of manufacturing a transflective substrate, a photosensitive resin 132 is first applied on a second substrate 120 as shown in Figure (a). Then the resin is subjected to first exposure by using a first reticle 145 as shown in Figure (b), and then to second exposure by using a second reticle 148 as shown in Figure (c). After the two steps of exposure, the resin is developed to form a base layer 130. In the exposure process, areas of a light transmitting part 146a for an opening and of a light transmitting part 149a for an opening are varied from each other so as to form a step 130a in the side wall of an opening 125. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005134474(A) |
申请公布日期 |
2005.05.26 |
申请号 |
JP20030367678 |
申请日期 |
2003.10.28 |
申请人 |
SEIKO EPSON CORP |
发明人 |
OTAKE TOSHIHIRO;KANEKO HIDEKI;UEHARA TOSHINORI;NAKANO TOMOYUKI;TAKIZAWA KEIJI |
分类号 |
G02B5/02;G02F1/13;G02F1/1335;G03F7/20;G03F7/40 |
主分类号 |
G02B5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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