发明名称 SURFACE CLEANING/MODIFYING METHOD AND SURFACE CLEANING/MODIFYING DEVICE
摘要 <p>A self-cleaning process, in which an elastic abrasive body (231) itself is cleaned by pressing the elastic abrasive body (231) against a pressed part (221) to deform the elastic abrasive body (231) while the elastic abrasive body (231) is rotated and supplied with slurry L containing an abrasive, is added to a scrub cleaning process in which a plastic optical component (1) is cleaned while being rotated by supplying slurry L containing an abrasive to between the surface of the plastic optical component (1) and the elastic abrasive body (231) that is rotated while being pressed against the surface of the plastic optical component (1). The above method offers a surface cleaning/modifying method and a surface cleaning/modifying device which leave no stain and cause no deep scar on the surface of the plastic optical component when the plastic optical component is polished and cleaned via an abrasive.</p>
申请公布号 WO2005046933(A1) 申请公布日期 2005.05.26
申请号 WO2004JP17132 申请日期 2004.11.11
申请人 SEIKO EPSON CORPORATION 发明人 HOSODA, TAKASHI
分类号 G02C13/00;B08B1/00;B08B1/04;B08B3/04;B08B7/02;B08B7/04;B24B13/00;B24B53/007;(IPC1-7):B24B13/005;G02B1/04 主分类号 G02C13/00
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