| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing device for extremely efficiently polishing a hard material such as ceramic, sapphire, hard alumina, and silicon carbide, with minute diamond abrasive grains. <P>SOLUTION: The polishing device is characterized by having a polishing surface plate which is made of high-purity iron having the purity of 99% or more. The preferred purity of the iron is set to 99.9% or more. It is further preferred if the amount of carbon contained in the high-purity iron is set to 0.01% or less because the high-purity iron exhibits further improved performance as the polishing surface plate. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
