发明名称 RADIATION-SENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency at a wavelength of &le;193 nm, in particular, showing excellent LER (line edge roughness). <P>SOLUTION: The radiation-sensitive resin composition contains: (A) a resin having a structural unit expressed by formula (I); (B) a resin having a repeating unit expressed by general formula (II); and (C) a radiation-sensitive acid generating agent. In formula (I), R<SP>1</SP>represents a bivalent (alicyclic) hydrocarbon group which may be substituted; R<SP>2</SP>represents a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group; or any two of R<SP>2</SP>are coupled to form a bivalent (substituted) alicyclic hydrocarbon group and the rest R<SP>2</SP>represents a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group. In formula (II), R<SP>3</SP>represents H, F or a trifluoromethyl group; R<SP>4</SP>represents a (substituted) hydrocarbon group having the valence of (c+1), a (substituted) alicyclic hydrocarbon group or a (substituted) aromatic group; R<SP>5</SP>represents H or a monovalent acid dissociable group; a and b represent 0 to 3 satisfying (a+b)&ge;1; and c represents 1 to 3. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005134456(A) 申请公布日期 2005.05.26
申请号 JP20030367470 申请日期 2003.10.28
申请人 JSR CORP 发明人 NISHIMURA ISAO;SHIMOKAWA TSUTOMU;SUGIURA MAKOTO
分类号 G03F7/039;C08F22/20;C08G2/00;C08G77/14;C08K5/00;C08K5/42;C08L83/06;G03F7/075;H01L21/027 主分类号 G03F7/039
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