| 摘要 |
PROBLEM TO BE SOLVED: To obtain a new polymerizable fluorine-containing ester compound useful as a monomer for producing a base resin for resits, excellent in transparency to laser light having≤500nm wavelength, especially≤200nm wavelength and dry etching resistance, and having good development characteristics and produced by using easily available and useable raw material, and provide a method for producing the same. SOLUTION: The polymerizable fluorine-containing ester compound is expressed by general formula (1) or (2). In each formula, R<SP>1</SP>expresses H, methyl or trifluoromethyl; R<SP>2</SP>and R<SP>3</SP>express each independently H or a monovalent hydrocarbon group, or may mutually bond to form a ring together with carbon atoms to which they bond and, in this case, express a 1-15C divalent hydrocarbon group which may contain a heteroatom or atoms; R<SP>4</SP>expresses H, OH or a monovalent hydrocarbon group; R<SP>5</SP>expresses an unstable acid group. COPYRIGHT: (C)2005,JPO&NCIPI
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