PLASMA IGNITING METHOD AND SUBSTRATE PROCESSING METHOD
摘要
<p>A method to solve such a problem that plasma will not ignite in restarting operation of a processing container that has not been operated with the inside kept drawn to vacuum. Gas containing oxygen is passed in a processing container (21), and ultraviolet light is irradiated to the gas while gas inside the processing container (21) is being discharged. After that, a remote plasma source (26) is driven to ignite plasma.</p>
申请公布号
WO2005048337(A1)
申请公布日期
2005.05.26
申请号
WO2004JP16588
申请日期
2004.11.09
申请人
TOKYO ELECTRON LIMITED;IGETA, MASANOBU;YAMAZAKI, KAZUYOSHI;AOYAMA, SHINTARO;SHINRIKI, HIROSHI
