| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing system which is suitable for manufacturing a high-integration/high-performance semiconductor device in a semiconductor manufacturing equipment, by reducing the usage and discharge of chemicals and ultrahigh pure water, and establishing a cleaning method of total process at a room temperature, in which the generation of chemical vapor is inhibited, and to provide a clean room in which the productivity of manufacturing the semiconductor is made very high, the running cost of the factory is reduced sharply, and the flexibility of design is markedly improved, by installing the semiconductor manufacturing system. SOLUTION: A room-temperature washer for a semiconductor substrate a processing device which processes the semiconductor substrate after cleaning, are arranged in the order of the process, and a substrate transport distance is most shortened. COPYRIGHT: (C)2005,JPO&NCIPI
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