发明名称 SYSTEM FOR PREDICTING EQUIPMENT CONDITION AND ITS METHOD, AND EXPOSURE EQUIPMENT MANAGEMENT SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a system and a method for predicting changes in the condition of a substrate processing equipment, such as exposure equipment, from environmental changes. SOLUTION: A plurality of the substrate processing equipment 11 and a maintenance management server 13 are installed in a substrate processing plant 10. Each substrate processing equipment 11 is provided with various kinds of sensors, to detect the environment of both the outside and the inside or the like (temperature, humidity, atmospheric pressure or the like). The maintenance management server 13 predicts the conditions of each substrate processing equipment 11, based on the relational expression showing a correlation between the change in environment, obtained beforehand and the change in condition of each substrate processing equipment 11, and based on detection results of the various kinds of the sensors. If a predicted result of the equipment condition is equal to a predetermined threshold or larger, the system gives a warning or transmits a control command to make the equipment condition adjusted, to the substrate processing equipment 11 of which the equipment condition has deteriorated. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005136326(A) 申请公布日期 2005.05.26
申请号 JP20030372718 申请日期 2003.10.31
申请人 NIKON CORP 发明人 SHIRAISHI KENICHI
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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