发明名称 |
Semiconductor device having high drive current and method of manufacture therefor |
摘要 |
A semiconductor device including an isolation region located in a substrate, an NMOS device located partially over a surface of the substrate, and a PMOS device isolated from the NMOS device by the isolation region and located partially over the surface. A first one of the NMOS and PMOS devices includes one of: (1) first source/drain regions recessed within the surface; and (2) first source/drain regions extending from the surface. A second one of the NMOS and PMOS devices includes one of: (1) second source/drain regions recessed within the surface wherein the first source/drain regions extend from the surface; (2) second source/drain regions extending from the surface wherein the first source/drain regions are recessed within the surface; and (3) second source/drain regions substantially coplanar with the surface.
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申请公布号 |
US2005110082(A1) |
申请公布日期 |
2005.05.26 |
申请号 |
US20030722218 |
申请日期 |
2003.11.25 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHENG SHUI-MING;FUNG KA-HING;CHENG KUAN L.;SHEU YI-MING |
分类号 |
H01L21/336;H01L21/8238;(IPC1-7):H01L29/76 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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