Method for coating internal surface of plasma processing chamber

摘要

The present invention comprises an aluminum base material 2 constituting the plasma processing chamber of the plasma processing apparatus, a bonding layer 3 deposited on the base material consisting of a transition metal or transition metal alloy that modifies the difference in thermal expansion coefficient of the base material and the material constituting a plasma contact surface, and the plasma contact surface 1 formed of a material selected from a group consisting of La₂O₃, LaAlO₃, MgLaAl₁₁O₁₉, and a mixture of La₂O₃ and Al₂O₃ being a metal oxide including at least La and O deposited on the bonding layer 3 via a thermal spray process.