| 摘要 |
<p>A cleaning system designed for cleaning a water supply apparatus wich is provided with :a tap water inlet (2);a mineral dosing ubtil unit(18) with the aid of which,on the basis of tap water ,mineral water can be generated; water processing means and a control unit(24) designed for controlling at least a part of the water processing means according to a predetermined water processing program for the purpose of presenting mineral water ,the cleaning system being provided with at least one cleaning agent vessel (H) from which ,in use ,cleaning agent can be supplied ,directly or indirectly,to the water supply apparatus , wherein the cleaning system is provided with a cleaning system control unit designed for controlling at least a part of the water processing means according to a predetermined cleaning program for the purpose of a cleaning at least a part of the water processing means.</p> |
