发明名称 VERTICALLY STACKED INTEGRATED CIRCUITS DEVICE COMPRISING MULTI-SUBSTRATES AND METHOD OF MANUFACTURING THE SAME
摘要 Provided are a stacked integrated circuit device including multiple substrates and a method of manufacturing the same. A first integrated circuit substrate, a first integrated circuit formed on the first integrated circuit substrate, and a first passivation insulating layer are sequentially formed. Then, wafer bonding technique for forming an SOI substrate is used, thereby forming a second integrated circuit substrate on the first passivation insulating layer. While forming a second integrated circuit on the second integrated circuit substrate, at least one device-connecting interconnect electrically connects the first and second Integrated circuits and penetrates the second integrated circuit substrate and the first passivation layer. A second passivation insulating layer is formed on an upper surface of the second integrated circuit.
申请公布号 KR20050049101(A) 申请公布日期 2005.05.25
申请号 KR20030082974 申请日期 2003.11.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOE, JEONG DONG;LEE, SUNG YOUNG;OH, CHANG WOO;PARK, DONG GUN
分类号 H01L23/12;H01L21/762;H01L21/822;H01L25/065;H01L27/06;(IPC1-7):H01L23/12 主分类号 H01L23/12
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