发明名称 Method of measuring aberration in an optical imaging system
摘要 A method of determining aberration of an optical imaging system comprises measuring at least one parameter, such as position of best-focus and/or lateral position, of an image formed by the imaging system. This is repeated for a plurality of different illumination settings of the imaging system, and from these measurements at least one coefficient, representative of aberration of said imaging system, is calculated.
申请公布号 US6897947(B1) 申请公布日期 2005.05.24
申请号 US20030683275 申请日期 2003.10.14
申请人 ASML NETHERLANDS B.V. 发明人 VAN DER LAAN HANS;MOERS MARCO H
分类号 G03F7/20;(IPC1-7):G01B9/00 主分类号 G03F7/20
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