发明名称 |
Avoiding shorting in capacitors |
摘要 |
A capacitor structure having a capacitor with a top electrode, a bottom electrode, and a capacitor dielectric layer between the top and bottom electrodes is disclosed. The capacitor includes upper and lower portions. The demarcation between the upper and lower portion is located between top and bottom surfaces of the capacitor dielectric layer. A dielectric layer is provided on the sidewalls of the upper portion of the capacitor to prevent shorting between the electrodes that can be caused by a conductive fence formed during processing.
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申请公布号 |
US6897501(B2) |
申请公布日期 |
2005.05.24 |
申请号 |
US20030248897 |
申请日期 |
2003.02.28 |
申请人 |
INFINEON TECHNOLOGIES AKTIENGESELLSCHAFT |
发明人 |
ZHUANG HAOREN;EGGER ULRICH;LIAN JINGYU;BEITEL GERHARD;HORNIK KARL |
分类号 |
H01L21/02;H01L21/8246;H01L27/08;H01L27/115;(IPC1-7):H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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